The Helios NanoLab™ 660 features FEI’s most recent advances in field emission SEM (FESEM) and focused ion beam (FIB) technologies and their combined use. As FEI’s 11th DualBeam™ platform, it is designed to access a new world of extreme high resolution (XHR) 2D and 3D characterization, nanoprototyping, and highest quality sample preparation. Point resolution: 0.6nm at 20kV.
The key benefits include:
- XHR with sub-nanometer resolution from 500 V to 30 kV;
- Sharp, refined, and charge-free contrast;
- Shortest time to precise cross-sectioning;
- High productivity preparation of the thinnest samples
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